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1. Diamondlike carbon high-temperature diffusion barrier for copper-gasketed stainless-steel flanges. Nyaiesh, A. R.; Garwin, E. L.; Hoyt, E. W. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films vol. 5 issue 5 September 1987. p. 2977-2977

 Diamondlike carbon films of 5-15 nm were deposited on copper gaskets which were… (more)

Keywords: CARBON; DIFFUSION BARRIERS; DIFFUSION; COPPER; ATOM TRANSPORT; DIAMONDS; FLANGES; GASKETS; BONDING; SEALS; COUPLING; STAINLESS STEEL−304; BAKING; LEAKS; THIN FILMS; SURFACE COATING; COATINGS

DOI: 10.1116/1.574239. ISSN: 0734-2101.

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2. TiN high temperature diffusion barrier for copper-gasketed stainless-steel flanges. Garwin, E. L.; Hoyt, E. W.; Nyaiesh, A. R. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films vol. 4 issue 6 November 1986. p. 2537-2538

 Klystrons manufactured at the Stanford Linear Accelerator Center are typically baked at temperatures… (more)

Keywords: TITANIUM NITRIDES; DIFFUSION BARRIERS; DIFFUSION; ATOM TRANSPORT; FLANGES; GASKETS; KLYSTRONS; COPPER; CONTAMINATION; STAINLESS STEEL−304; STANFORD LINEAR ACCELERATOR CENTER; SEALS; BAKING; VERY HIGH TEMPERATURE

DOI: 10.1116/1.573725. ISSN: 0734-2101.

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3. Properties of thin antimultipactor TiN and Cr2O3 coatings for klystron windows. Nyaiesh, A. R.; Garwin, E. L.; King, F. K.; Kirby, R. E. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films vol. 4 issue 5 September 1986. p. 2356-2363

 Low secondary electron emission yield (1—1.3), low radio-frequency (rf) loss films are of… (more)

Keywords: KLYSTRONS; WINDOWS; OPERATION; TITANIUM NITRIDES; CHROMIUM OXIDES; COATINGS; SURFACE COATING; SECONDARY EMISSION; STABILITY; OXIDATION; CERAMICS; ALUMINIUM OXIDES; THIN FILMS

DOI: 10.1116/1.574076. ISSN: 0734-2101.

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4. Summary Abstract: Properties of thin antimultipactor coatings for klystron windows. Nyaiesh, A. R.; Garwin, E. L.; King, F. K.; Kirby, R. E. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films vol. 4 issue 3 May 1986. p. 1705-1705

DOI: 10.1116/1.573960. ISSN: 0734-2101.

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5. Diffusion of nickel through titanium nitride films. Nowak, W. B.; Keukelaar, R.; Wang, W.; Nyaiesh, A. R. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films vol. 3 issue 6 November 1985. p. 2242-2245

 TiN is among the candidates for thin film diffusion barriers on integrated circuit… (more)

Keywords: NICKEL; DIFFUSION; ATOM TRANSPORT; TITANIUM NITRIDES; DEPOSITION; SAMARIUM; DIFFUSION BARRIERS; INTEGRATED CIRCUITS; LOW PRESSURE; THICKNESS; CRYSTAL STRUCTURE; CHEMICAL VAPOR DEPOSITION; HIGH TEMPERATURE; HARDNESS; SPUTTERING; CHEMICAL COMPOSITION; SCANNING ELECTRON MICROSCOPY; ELECTRIC CONDUCTIVITY; VAPOR PLATING; COATINGS

DOI: 10.1116/1.572900. ISSN: 0734-2101.

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6. New radio frequency technique for deposition of hard carbon films. Nyaiesh, A. R.; Kirby, R. E.; King, F. K.; Garwin, E. L. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films vol. 3 issue 3 May 1985. p. 610-613

 We have developed a new technique to produce diamondlike carbon films in an… (more)

Keywords: CARBON; SURFACE COATING; METHANE; IONIZATION; DISSOCIATION; ELECTRODES; MASS SPECTROSCOPY; AUGER ELECTRON SPECTROSCOPY; PHOTOELECTRON SPECTROSCOPY; PHYSICAL PROPERTIES; CORROSION RESISTANCE; ETCHING; OPTICAL PROPERTIES; ELECTRICAL PROPERTIES; SURFACE PROPERTIES

DOI: 10.1116/1.572961. ISSN: 0734-2101.

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7. Chemisorbed hydrogen on a-carbon films. Nyaiesh, A. R.; Nowak, W. B. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films vol. 1 issue 2 April 1983. p. 308-312

 Hard, relatively transparent, amorphous carbon films have potential applications as wear-resistant coatings, including… (more)

Keywords: chemisorption; hydrogen; carbon; films; sorptive properties; microstructure; glow discharges; hydrogen bonds; desorption; high temperature; heat treatments

DOI: 10.1116/1.572120. ISSN: 0734-2101.

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8. Reactive magnetron sputtering of titanium and its oxides. Nyaiesh, A. R.; Holland, L. The Journal of Vacuum Science and Technology vol. 20 issue 4 April 1982. p. 1389-1392

 Ti and TiOx films have been made by vacuum and reactive evaporation, respectively,… (more)

Keywords: MAGNETRONS; SPUTTERING; TITANIUM; TITANIUM OXIDES; IV CHARACTERISTICS; OXYGEN; ARGON; FILMS; GROWTH; DEPOSITION; ELECTRIC DISCHARGES; VACUUM EVAPORATION; VACUUM COATINGS; VAPOR DEPOSITED COATINGS; OXIDATION; HIGH VACUUM; CRYSTAL GROWTH; GLASS

DOI: 10.1116/1.571613. ISSN: 0022-5355.

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